High accurate CD control at stitching region for electron beam projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 727-735

  Fujiwara, T ^a   Irita, T ^a   Shimizu, S ^a   Yamamoto, H ^a   Suzuki, K ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; DEFORMATION; EDGE DETECTION; ELECTRON SCATTERING; FEATURE EXTRACTION; FUZZY SETS; PATTERN MATCHING; PROJECTION SYSTEMS;

CRITICAL DIMENSION (CD);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034758305     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436696     Document Type: Conference Paper

References (3)

1. Critical issues for developing a high-throughput SCALPEL system for sub-0.18microm lithography generations
2. Nikon EB stepper: Its system concept and countermeasures for critical issues
3. Ion projection lithography: Status of the MEDEA project and United States/European cooperation