Investigation of proximity effect correction in electron projection lithography (EPL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 235-244

  Okino, Teruaki ^a   Suzuki, Kazuaki ^a   Okamoto, Kazuya ^a   Kawata, Shintaro ^a   Uchikawa, Kiyoshi ^a   Suzuki, Syouhei ^a   Shimizu, Sumito ^a   Fujiwara, Tomoharu ^a   Yamada, Atsushi ^a   Kamijo, Koichi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SCATTERING; INTEGRATED CIRCUIT MANUFACTURE; NANOTECHNOLOGY;

ELECTRON PROJECTION LITHOGRAPHY; PROXIMITY EFFECT;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033684165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)