Effect of magnetic field on the growth of α-Fe 2 O 3 thin films by atomic layer deposition

Applied Surface Science

Volumn 227, Issue 1-4, 2004, Pages 40-47

  Nilsen, O ^a   Lie, M ^a   Foss, S ^a   Fjellvag H ^a   Kjekshus, A ^a  

^a UNIVERSITY OF OSLO   (Norway)

Author keywords

Atomic layer deposition (ALD); Effect of magnetic field; Hematite Fe 2 O 3

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMISORPTION; CRYSTAL STRUCTURE; DEPOSITION; EPITAXIAL GROWTH; FERROMAGNETISM; FILM GROWTH; MAGNETIC FIELD EFFECTS; POLYCRYSTALLINE MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER DEPOSITION (ALD); HEMATITE Α-FE2O3;

IRON OXIDES;

EID: 1842582302     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.10.045     Document Type: Article

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