Effects of Cr and Nb doping on the ferroelectricity of chemical-solution- deposited Bi 3.5 Nd 0.5 Ti 3 O 12 films

Applied Surface Science

Volumn 245, Issue 1-4, 2005, Pages 376-383

  Chang, Tian Lin ^a   Lin, Wen Tai ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

BiNdTiO films; Ferroelectricity; Ion doping

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CHROMIUM; DEPOSITION; FERROELECTRICITY; NEODYMIUM; NIOBIUM; POSITIVE IONS; SOLUTIONS; TITANIUM;

ANNEALING PROCESSING; BINDTIO FILMS; ION DOPING; REMANENT POLARIZATION;

THIN FILMS;

EID: 17044420075     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.032     Document Type: Article

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