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Volumn 86, Issue 7, 2005, Pages 1-3

Fracture toughness of polycrystalline silicon carbide thin films

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FRACTURE TOUGHNESS; INDENTATION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; STRESS CORROSION CRACKING; STRESS INTENSITY FACTORS; TENSILE STRESS;

EID: 17044397795     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1864246     Document Type: Article
Times cited : (32)

References (23)
  • 20
    • 17044388103 scopus 로고    scopus 로고
    • The finite element code FRANC2D was used to determine stress intensities. This code is available from the Cornell Fracture Group at http:www.cfg.cornell. edu
  • 21
    • 17044381652 scopus 로고    scopus 로고
    • Masters thesis, Case Western Reserve University
    • J. S. Mitchell, Masters thesis, Case Western Reserve University, 2000.
    • (2000)
    • Mitchell, J.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.