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Volumn 8, Issue 3, 1999, Pages 237-242

Surface micromachining of polycrystalline SiC films using microfabricated molds of SiO2 and polysilicon

Author keywords

[No Author keywords available]

Indexed keywords

MICROACTUATORS; MICROMACHINING; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; SILICA;

EID: 0032595007     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.788626     Document Type: Article
Times cited : (47)

References (13)
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  • 2
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    • Mechanical properties of 3C silicon carbide
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  • 5
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    • Reactive ion etching of SiC thin films using fiuorinated gases
    • J. Sugiura, W. J. Lu, L. C. Cadien, and A. J. Steckl, "Reactive ion etching of SiC thin films using fiuorinated gases," J. Vacuum Sci. Technol. B. vol. 4, no. 1, pp. 349-354, 1986.
    • (1986) J. Vacuum Sci. Technol. B , vol.4 , Issue.1 , pp. 349-354
    • Sugiura, J.1    Lu, W.J.2    Cadien, L.C.3    Steckl, A.J.4
  • 7
    • 0025249385 scopus 로고
    • Reactive ion etching of SiC thin films by mixtures of fluorinated gases and oxygen
    • W. S. Pan and A. J. Steckl, "Reactive ion etching of SiC thin films by mixtures of fluorinated gases and oxygen," J. Electrochem. Soc., vol. 137, no. 1, pp. 212-220, 1990.
    • (1990) J. Electrochem. Soc. , vol.137 , Issue.1 , pp. 212-220
    • Pan, W.S.1    Steckl, A.J.2
  • 9
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    • Fabrication of smooth 3-SiC surfaces by reactive ion etching using a graphite electrode
    • W. Reichert, D. Stefan, E. Obermeier, and W. Wondrak, "Fabrication of smooth 3-SiC surfaces by reactive ion etching using a graphite electrode," Mater. Sci. Eng. B. vol. 46, pp. 190-194, 1997.
    • (1997) Mater. Sci. Eng. B , vol.46 , pp. 190-194
    • Reichert, W.1    Stefan, D.2    Obermeier, E.3    Wondrak, W.4
  • 10
    • 0027610378 scopus 로고
    • Effects of hydrogen additive on obtaining residue-free reactive ion etching of 3-SiC in fluorinated plasmas
    • P. Yip and A. J. Steckl, "Effects of hydrogen additive on obtaining residue-free reactive ion etching of 3-SiC in fluorinated plasmas," J. Electrochem. Soc., vol. 140, no. 6, pp. 1813-1824, 1993.
    • (1993) J. Electrochem. Soc. , vol.140 , Issue.6 , pp. 1813-1824
    • Yip, P.1    Steckl, A.J.2
  • 11
    • 0030784113 scopus 로고    scopus 로고
    • Chemical-mechanical polishing for polysilicon surface micromachining
    • A. A. Yasseen, N. J. Mourlas, and M. Mehregany, "Chemical-mechanical polishing for polysilicon surface micromachining," J. Electrochem. Soc., vol. 144, no. 6, pp. 237-242, 1997.
    • (1997) J. Electrochem. Soc. , vol.144 , Issue.6 , pp. 237-242
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  • 12
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    • Roughness reduction of 3C-SiC surfaces using SiC-based mechanical polishing slurries
    • A. A. Yasseen, C. A. Zorman, and M. Mehregany, "Roughness reduction of 3C-SiC surfaces using SiC-based mechanical polishing slurries," J. Electrochem. Soc., vol. 146, no. 1, pp. 327-330, 1999.
    • (1999) J. Electrochem. Soc. , vol.146 , Issue.1 , pp. 327-330
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  • 13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.