Doping and hydrogen in wide gap oxides

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 155-160

  Robertson, J ^a   Peacock, P W ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Doping; Hydrogen; Oxide; Wide gap

Indexed keywords

BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTANCE; FIELD EFFECT TRANSISTORS; HYDROGEN; IMPURITIES; MATHEMATICAL MODELS; MOS DEVICES; SEMICONDUCTOR MATERIALS;

ATOMIC LAYER DEPOSITION (ALD); WIDE GAP;

OXIDES;

EID: 1642343571     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.08.013     Document Type: Conference Paper

References (22)

1. Walukiewicz W. Physica B. 302:2001;123.
2. Kawazoe H., Yasukawa M., Hyodo H., Kureita M., Yanagi H., Hosono H. Nature. 389:1997;939.
3. Wilk G., Wallace R.M., Anthony J.M. J. Appl. Phys. 89:2001;5243.
4. Hubbard H.J., Schlom D.G. J. Mater. Res. 11:1996;2757.
5. Robertson J. J. Vac. Sci. Technol. B. 18:2000;1785.
6. E.P. Gusev, et al., Tech Digest-Int Electron Devices Meeting (2001).
7. Ragnarsson L.A., Guha S., Copel M., Cartier E., Bojarczuk N.A., Karasinski J. Appl. Phys. Lett. 78:2001;4169.
8. Copel M., Cartier E., Narayanan V., Reuter M.C., Guha S., Bojarczuk N. Appl. Phys. Lett. 81:2002;4227.
9. Houssa M., Afanasev V.V., Stesmans A., Heyns M.M. Appl. Phys. Lett. 77:2000;1885.
10. van de Walle C.G., Denteener P.J.H., Bar Yam Y., Pantelides S.T. Phys. Rev. B. 39:1989;10791.
11. Pavesi L., Giannozzi P. Phys. Rev. B. 46:1992;4621.
12. Neugebauer J., van de Walle C.G. Phys. Rev. Lett. 75:1995;4452.
13. van de Walle C.G. Phys. Rev. Lett. 85:2000;1012.
14. Payne M.C., Teter M.P., Allan D.C., Arias T.A., Joannopoulos J.D. Rev. Mod. Phys. 64:1992;1045.
15. Vanderbilt D. Phys. Rev. B. 41:1990;7892.
16. Yokozawa A., Miyamoto Y. Phys. Rev. B. 55:1997;13783.
17. P.E. Blochl, J.H. Stathis, 83 (1999) 372.
18. Kilic C., Zunger A. Appl. Phys. Lett. 81:2002;73.
19. Park C.H., Chadi D.J. Phys. Rev. Lett. 84:2000;4717.
20. Miyakawa M., Noshino R., Ogawa T., Ueda K., Kawazoe H., Ohta H., Orita M., Hirano M., Hosono H. J. Appl. Phys. 91:2002;2122.
21. Sayan S., Grafunkel E., Suzer S. Appl. Phys. Lett. 80:2002;2135.
22. van de Walle C.G., Neugebauer J. Nature. 423:2002;626.