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Applied Physics A: Materials Science and Processing

Volumn 80, Issue 6, 2005, Pages 1133-1140

A novel interconnection technique for manufacturing nanowire devices

(4) Islam, M Saif a Sharma, S a Kamins, T I a Williams, R Stanley a

a HEWLETT PACKARD LABORATORIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL VAPOR DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; ELECTRODES; INTEGRATED CIRCUITS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SEMICONDUCTOR MATERIALS; SILICON ON INSULATOR TECHNOLOGY; SYNTHESIS (CHEMICAL); WIRE;

ELECTRICALLY ISOLATED STRUCTURE; INTERCONNECTION TECHNIQUES; NANOWIRE DEVICES; PHOTONIC DEVICES;

NANOSTRUCTURED MATERIALS;

EID: 16244408357 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-3177-x Document Type: Article

Times cited : (82)

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