Characteristics of single crystal "thin film" capacitor structures made using a focused ion beam microscope

Applied Physics Letters

Volumn 84, Issue 7, 2004, Pages 1159-1161

  Saad, M M ^a   Bowman, R M ^a   Gregg, J M ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; CAPACITORS; ELECTRODES; FREQUENCY RESPONSE; ION BEAMS; ION IMPLANTATION; MICROSCOPIC EXAMINATION; PERMITTIVITY; THIN FILMS;

FOCUSED ION BEAM (FIB) MICROSCOPE; GAS BREAKDOWN DEPOSITION;

SINGLE CRYSTALS;

EID: 1542784196     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1645318     Document Type: Article

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