A new polarised hot filament chemical vapor deposition process for homogeneous diamond nucleation on Si(100)

Diamond and Related Materials

Volumn 13, Issue 2, 2004, Pages 270-276

  Cojocaru, C S ^a   Larijani, M ^a   Misra, D S ^b   Singh, M K ^b   Veis, P ^c   Le Normand, F ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^c Physics and Informatics   (Slovakia)

Author keywords

Bias enhanced HFCVD; Diamond; HFCVD; Nucleation; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; FILM GROWTH; GLOW DISCHARGES; NUCLEATION; PLASMAS; SILICON;

HIGH-DENSITY NUCLEATION; HOT FILAMENT CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

DIAMOND;

EID: 1542348310     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.076     Document Type: Article

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