Mechanisms of CVD diamond nucleation and growth on mechanically scratched Si(100) surfaces

European Physical Journal B

Volumn 11, Issue 2, 1999, Pages 327-343

  Arnault, J C ^a   Demuynck, L ^a   Speisser, C ^a   Le Normand, F ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

81.05.Tp Fullerenes and related materials; diamonds, graphite; 81.15.Gh Chemical vapor deposition (including plasma enhanced CVD, MOCVD, etc.); 82.65. i Surface and interface chemistry

Indexed keywords

EID: 0000588243     PISSN: 14346028     EISSN: None     Source Type: Journal    
DOI: 10.1007/s100510050943     Document Type: Article

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