Heteroepitaxial nucleation of diamond on Si(100) via double bias-assisted hot filament chemical vapor deposition

Diamond and Related Materials

Volumn 9, Issue 2, 2000, Pages 134-139

  Zhou, X T ^a   Peng, H Y ^a   Sun, C ^a   Zhang, W J ^a   Wang, N ^a   Bello, I ^a   Lee, C S ^a   Lee, S T ^a   Lai, H L ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Biases assisted hot filament chemical vapor deposition; Diamond; Heteroepitaxial nucleation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DENSITY (SPECIFIC GRAVITY); ELECTRIC POTENTIAL; EPITAXIAL GROWTH; FILM GROWTH; ION BOMBARDMENT; MICROWAVES; NUCLEATION; PLASMA APPLICATIONS; PLASMA STABILITY; SILICON;

HETEROEPITAXIAL GROWTH; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

DIAMOND FILMS;

CORROSION PROTECTION; DIAMOND COATING; VAPOR DEPOSITION;

EID: 0034115588     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00264-2     Document Type: Article

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