Mechanism of diamond nucleation enhancement by electron emission via hot filament chemical vapor deposition

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 123-126

  Wang, W L ^a   Liao, K J ^a   Wang, J ^a   Fang, L ^a   Ding, P D ^a   Esteve, J ^b   Polo, M C ^b   Sanchez, G ^b  

^a CHONGQING UNIVERSITY   (China)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Bias; Chemical vapor deposition; Diamond films; Nucleation

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRODES; ELECTRON EMISSION; FILM GROWTH; INFRARED SPECTROSCOPY; NUCLEATION; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIAMOND FILMS;

EID: 0032622257     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00317-3     Document Type: Article

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