Plasma sources for electrons and ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2776-2778

  Leung, Ka Ngo ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040114962     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591063     Document Type: Article

References (11)

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2. K. W. Ehlers, K. N. Leung, P. A. Pincosy, and M. C. Vella, Appl. Phys. Lett. 41, 517 (1982).
3. K. N. Leung, P. Herz, W. B. Kunkel, Y. Lee, L. Perkins, D. Pickard, M. Sarstedt, M. Weber, and M. D. Williams, J. Vac. Sci. Technol. B 13, 2600 (1995).
4. Y. Lee et al., Nucl. Instrum. Methods Phys. Res. A 385, 204 (1997).
5. W. H. Bruenger (private communication).
6. Y. Lee, R. A. Gough, W. B. Kunkel, K. N. Leung, J. Vujic, M. D. Williams, D. Wutte, and N. Zahir, Rev. Sci. Instrum. 69, 877 (1998).
7. V. V. Ngo, W. Barletta, R. Gough, Y. Lee, K. N. Leung, and N. Zahir, J. Vac. Sci. Technol. B, these proceedings.
8. Q. Ji, T. J. King, Y. Y. Lee, and K. N. Leung, J. Vac. Sci. Technol. B, these proceedings.
9. Y. Lee, R. A. Gough, K. N. Leung, J. Vujic, M. D. Williams, N. Zahir, W. Fallman, M. Tockler, and W. Brunger, J. Vac. Sci. Technol. B 16, 3367 (1998).
10. Y. Lee (private communication).
11. Q. Ji (private communication).