Early stages of microcrystalline silicon film growth on amorphous substrate with SiH4 gas heating

Thin Solid Films

Volumn 296, Issue 1-2, 1997, Pages 19-22

  Shirai, Hajime ^a   Arai, Takeshi ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

Amorphous substrate; Cathode heating technique; Crystallinity

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; HYDROGEN; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS;

CATHODE HEATING TECHNIQUE; MICROCRYSTALLINE SILICON;

SILICON;

EID: 0031098589     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09384-4     Document Type: Article

References (18)

1. S. Ishihara, D. He and I. Shimizu, Jpn. J. Appl. Phys., 33 (1994) 51.
2. A. Nakajima, Y. Sugita, K. Kawamura, H. Tomita and N. Yokoyama, Jpn. J. Appl. Phys., 35 (1995) 189.
3. M. Yamamoto, J. Hanna and M. Miyauchi, Appl. Phys. Lett., 63 (1993) 2508.
4. J. Hanna, Proc. Mater. Res. Soc. Symp. (1995) in press.
5. T. Matsuyama, M. Tanaka, S. Tsuda, S. Nakano and Y. Kuwano, Jpn. J. Appl. Phys., 32 (1993) 3720.
6. A.M. Antonie and B. Drevillon, J. Appl. Phys., 63 (1988) 360.
7. H.V. Nguyen and R.W. Collins, Phys. Rev. B, 47 (1993) 1911.
8. H. Shirai, B. Drevillon and I. Shimizu, Jpn. J. Appl. Phys., 33 (1994) 5590.
9. H. Shirai, Jpn. J. Appl. Phys., 34 (1995) 450.
10. H. Shirai and T. Arai, J. Non-Cryst. Solids, 198-200 (1996) 931.
11. T. Arai and H. Shirai, Jpn. J. Appl. Phys., 35 (1996) 676.
12. T. Arai and H. Shirai, J. Appl. Phys., in press.
13. S. Koynov, S. Grebner, P. Radojkovic, E. Hartman, R. Schwartz, L. Vasilev, R. Krankenhagen, I. Sieber, H. Henrion and M. Schmidt, J. Non-Cryst. Solids, in press.
14. G. Ganguly and A. Matsuda, Phys. Rev. B, 47 (1993) 3661.
15. Y. Hishikawa, M. Sakaki, S. Tsuge and S. Tsuda, Jpn. J. Appl. Phys., 33 (1994) 4373.
16. D.A.G. Bruggeman, Ann. Phys. (Leipzig), 24 (1935) 636.
17. N. Yamauchi and R. Reif, J. Appl. Phys., 75 (1994) 3235.
18. P. Mei, J.B. Boyce, M. Hack, R. Lujan, S.E. Ready, D.K. Fork, R.I. Johnson and G.B. Anderson, J. Appl. Phys., 76 (1994) 3194.