High-density microwave plasma for high rate deposition of microcrystalline silicon

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 7-11

  Shirai, Hajime ^a   Sakuma, Yoshikazu ^a   Ueyama, Hiroyuki ^b  

^a SAITAMA UNIVERSITY   (Japan)

^b Nihon Koshuha Co   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MICROWAVES; PHOTOCONDUCTIVITY; PRESSURE EFFECTS; SILANES; SILICON;

HIGH DENSITY MICROWAVE PLASMA; HYDROGENATED MICROWAVE SILICON; LOW ELECTRON TEMPERATURE;

PLASMA APPLICATIONS;

EID: 0033531834     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00097-8     Document Type: Article

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