Spatial distribution of the high-density microwave plasma and its effect on crystal silicon film growth

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 8 A, 2000, Pages

  Shirai, Hajime ^a   Sakuma, Yoshikazu ^a   Yoshino, Koichi ^a   Ueyama, Hiroyuki ^b  

^a SAITAMA UNIVERSITY   (Japan)

^b Nihon Koshuha Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL STRUCTURE; ION BEAMS; PLASMA APPLICATIONS; SEMICONDUCTING FILMS;

HIGH-DENSITY MICROWAVE PLASMA;

SEMICONDUCTING SILICON;

EID: 0034246386     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l782     Document Type: Article

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