-
4
-
-
13444308844
-
-
Method of Manufacturing Semiconductor Mirror Wafers. European Patent Application EP0782179A2
-
T. Fukami, H. Masumura, K. Suzuki, H. Kudo, Method of Manufacturing Semiconductor Mirror Wafers. European Patent Application EP0782179A2, 1997.
-
(1997)
-
-
Fukami, T.1
Masumura, H.2
Suzuki, K.3
Kudo, H.4
-
6
-
-
0242612541
-
Analysis of grinding marks as a key to ultra-precision surfaces
-
H.K. Tonshoff, M. Hartmann, and M. Klein Analysis of grinding marks as a key to ultra-precision surfaces Proceedings of the Third International Conference on Ultraprecision in Manufacturing Engineering, Aachen, Germany, May 1994 pp. 168-171
-
(1994)
Proceedings of the Third International Conference on Ultraprecision in Manufacturing Engineering, Aachen, Germany, May
-
-
Tonshoff, H.K.1
Hartmann, M.2
Klein, M.3
-
7
-
-
13444285794
-
-
Silicon Wafering Process Flow. US Patent 6,294,469
-
M. Kulkarni, A. Desai, Silicon Wafering Process Flow. US Patent 6,294,469, 2001.
-
(2001)
-
-
Kulkarni, M.1
Desai, A.2
-
8
-
-
0035456947
-
A comparative study between total thickness variance and site flatness of polished silicon wafer
-
H.S. Oh, and H.L. Lee A comparative study between total thickness variance and site flatness of polished silicon wafer Japanese Journal of Applied Physics, Part 1 40 9A 2001 5300 5301
-
(2001)
Japanese Journal of Applied Physics, Part 1
, vol.40
, Issue.9
, pp. 5300-5301
-
-
Oh, H.S.1
Lee, H.L.2
-
9
-
-
0031673835
-
The role of Fairchild in silicon technology in the early days of 'Silicon Valley'
-
G. Moore The role of Fairchild in silicon technology in the early days of 'Silicon Valley' Proceedings of the IEEE 86 1 1998 56
-
(1998)
Proceedings of the IEEE
, vol.86
, Issue.1
, pp. 56
-
-
Moore, G.1
-
10
-
-
13444297701
-
UMC ready for 90 nm, foundry says
-
5/24
-
Reed Business Information, UMC ready for 90 nm, foundry Says, Electronic News, 5/24/2004, retrieved from: http://www.reed-electronics.com/electronicnews/index.asp?layout= articlePrint&articleID=CA420457.
-
(2004)
Electronic News
-
-
-
11
-
-
0013231540
-
-
ISTWeb
-
Lithography, ISTWeb, retrieved from: http://www.cordis.lu/ist/ka4/mel/clusters_l.ithography.htm
-
Lithography
-
-
-
12
-
-
0032659647
-
Materials quality and materials cost - Are they on a collision course?
-
K.V. Ravi Materials quality and materials cost - are they on a collision course? Solid State Phenomena 69-70 1999 103 110
-
(1999)
Solid State Phenomena
, vol.69-70
, pp. 103-110
-
-
Ravi, K.V.1
-
13
-
-
13444295447
-
-
Method of Manufacturing Semiconductor Wafers. European patent application EP0798405A2
-
T. Kato, H. Masumura, S. Okuni, H.H. Kudo, Method of Manufacturing Semiconductor Wafers. European patent application EP0798405A2, 1997.
-
(1997)
-
-
Kato, T.1
Masumura, H.2
Okuni, S.3
Kudo, H.H.4
-
14
-
-
13444297128
-
-
Method of Processing Semiconductor Wafers. US Patent 6,114,245
-
R. Vandamme, Y. Xin, Z.J. Pei, Method of Processing Semiconductor Wafers. US Patent 6,114,245, 2000.
-
(2000)
-
-
Vandamme, R.1
Xin, Y.2
Pei, Z.J.3
-
19
-
-
0012830964
-
Process induced mechanical damage and fine grinding process parameters
-
Yonsei University Seoul, Korea
-
H.S. Oh, S.E. Park, S.M. Jeong, S.S. Kim, and H.L. Lee Process induced mechanical damage and fine grinding process parameters The Fourth International Symposium on Advances in Abrasive Technology (ISAAT'2001), November 6-9 2001 Yonsei University Seoul, Korea
-
(2001)
The Fourth International Symposium on Advances in Abrasive Technology (ISAAT'2001), November 6-9
-
-
Oh, H.S.1
Park, S.E.2
Jeong, S.M.3
Kim, S.S.4
Lee, H.L.5
-
23
-
-
0028094382
-
Generation of parabolic and toroidal surfaces on silicon and silicon-based compounds using diamond cup grinding wheels
-
Z. Zhong, and V.C. Venkatesh Generation of parabolic and toroidal surfaces on silicon and silicon-based compounds using diamond cup grinding wheels CIRP Annals - Manufacturing Technology 43 1 1994 323 326
-
(1994)
CIRP Annals - Manufacturing Technology
, vol.43
, Issue.1
, pp. 323-326
-
-
Zhong, Z.1
Venkatesh, V.C.2
-
25
-
-
0033154064
-
Precision cylindrical face grinding
-
A.J. Shih, and N.L. Lee Precision cylindrical face grinding Precision Engineering 23 3 1999 177 184
-
(1999)
Precision Engineering
, vol.23
, Issue.3
, pp. 177-184
-
-
Shih, A.J.1
Lee, N.L.2
-
27
-
-
0037378315
-
Three-dimensional kinematical analyses for surface grinding of large scale substrate
-
L. Zhou, J. Shimizu, K. Shinohara, and H. Eda Three-dimensional kinematical analyses for surface grinding of large scale substrate Precision Engineering 27 2003 175 184
-
(2003)
Precision Engineering
, vol.27
, pp. 175-184
-
-
Zhou, L.1
Shimizu, J.2
Shinohara, K.3
Eda, H.4
-
28
-
-
78249259724
-
Fine grinding of silicon wafers: Grinding marks
-
American Society of Mechanical Engineers, New York
-
Z.J. Pei, A. Strasbaugh, Fine grinding of silicon wafers: grinding marks, in: CD-ROM Proceedings of 2002 International Mechanical Engineering Congress and Exposition (IMECE 2002) Vol. 2, American Society of Mechanical Engineers, New York, 2002.
-
(2002)
CD-ROM Proceedings of 2002 International Mechanical Engineering Congress and Exposition (IMECE 2002)
, vol.2
-
-
Pei, Z.J.1
Strasbaugh, A.2
-
30
-
-
0025439729
-
Characterization of mirror-like wafer surfaces using the magic mirror method
-
S. Hahn, K. Kugimiya, M. Yamashita, P.R. Blaustein, and K. Takahashi Characterization of mirror-like wafer surfaces using the magic mirror method Journal of Crystal Growth 103 1-4 1990 423 432
-
(1990)
Journal of Crystal Growth
, vol.103
, Issue.1-4
, pp. 423-432
-
-
Hahn, S.1
Kugimiya, K.2
Yamashita, M.3
Blaustein, P.R.4
Takahashi, K.5
-
31
-
-
0026634583
-
Characterization of mirror-polished Si wafers and advanced Si substrate structures using the magic mirror method
-
S. Hahn, K. Kugimiya, K. Vojtechovsky, M. Sifalda, M. Yamashita, P.R. Blaustein, and K. Takahashi Characterization of mirror-polished Si wafers and advanced Si substrate structures using the magic mirror method Semiconductor Science and Technology 7 1A 1992 80 85
-
(1992)
Semiconductor Science and Technology
, vol.7
, Issue.1
, pp. 80-85
-
-
Hahn, S.1
Kugimiya, K.2
Vojtechovsky, K.3
Sifalda, M.4
Yamashita, M.5
Blaustein, P.R.6
Takahashi, K.7
-
32
-
-
0026630809
-
Characterization of deformations and texture defects on polished wafers of III-V compound crystals by the magic mirror method
-
C.C. Shiue, K.H. Lie, and P.R. Blaustein Characterization of deformations and texture defects on polished wafers of III-V compound crystals by the magic mirror method Semiconductor Science and Technology 7 1A 1992 95 97
-
(1992)
Semiconductor Science and Technology
, vol.7
, Issue.1
, pp. 95-97
-
-
Shiue, C.C.1
Lie, K.H.2
Blaustein, P.R.3
|