Materials quality and materials cost - are they on a collision course?

Solid State Phenomena

Volumn 69, Issue , 1999, Pages 103-109

  Ravi, K V ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COSTS; EPITAXIAL GROWTH; INTEGRATED CIRCUIT LAYOUT; LOGIC GATES; SEMICONDUCTING SILICON; SPECIFICATIONS;

NATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS (NTRS);

SILICON WAFERS;

EID: 0032659647     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/ssp.69-70.103     Document Type: Article

References (4)

1. 2 Interface-3, The Electrochemical Society, 352 (1995)
2. T. Yoshida, S. Miyazaki and H. Hirose, Ext. Abstracts of 1996 Intrn. Conf. On Solid State Devices and Materials, 539 (1996)
3. K. Okada, Symposium on VLSI Technol., Digest of Technical Papers, 143 (1997)
4. nd International Symposium on Advanced Science and Technology of Silicon Materials, The Japan Society for the Promotion of Science, 233 (1996)