-
2
-
-
7044273184
-
-
Silicon wafering process flow, U.S. Patent 6,294,469
-
M. Kulkarni, A. Desai, Silicon wafering process flow, U.S. Patent 6,294,469, 2001.
-
(2001)
-
-
Kulkarni, M.1
Desai, A.2
-
3
-
-
0035456947
-
A comparative study between total thickness variance and site flatness of polished silicon wafer
-
Oh H.S., Lee H.L. A comparative study between total thickness variance and site flatness of polished silicon wafer. Japanese Journal of Applied Physics, Part 1. 40:(9A):2001;5300-5301.
-
(2001)
Japanese Journal of Applied Physics, Part 1
, vol.40
, Issue.9 A
, pp. 5300-5301
-
-
Oh, H.S.1
Lee, H.L.2
-
4
-
-
0032659647
-
Materials quality and materials cost - Are they on a collision course?
-
Ravi K.V. Materials quality and materials cost - are they on a collision course? Solid State Phenomena. 69-70:1999;103-110.
-
(1999)
Solid State Phenomena
, vol.69-70
, pp. 103-110
-
-
Ravi, K.V.1
-
5
-
-
7044271623
-
-
Method of processing semiconductor wafers, U.S. Patent 6,114,245
-
R. Vandamme, Y. Xin, Z.J. Pei, Method of processing semiconductor wafers, U.S. Patent 6,114,245, 2000.
-
(2000)
-
-
Vandamme, R.1
Xin, Y.2
Pei, Z.J.3
-
10
-
-
1842854519
-
Fine grinding of silicon wafers: A mathematical model for the wafer shape
-
W.P. Sun, Z.J. Pei, G.R. Fisher, Fine grinding of silicon wafers: a mathematical model for the wafer shape, International Journal of Machine Tools and Manufacture 44 (7-8) (2004) 707-716.
-
(2004)
International Journal of Machine Tools and Manufacture
, vol.44
, Issue.7-8
, pp. 707-716
-
-
Sun, W.P.1
Pei, Z.J.2
Fisher, G.R.3
-
11
-
-
0012830964
-
Process induced mechanical damage and fine grinding process parameters
-
November 6-9, Yonsei University, Seoul, Korea
-
H.S. Oh, S.E. Park, S.M. Jeong, S.S. Kim, H.L. Lee, Process induced mechanical damage and fine grinding process parameters, in: The Fourth International Symposium on Advances in Abrasive Technology (ISAAT'2001), November 6-9, Yonsei University, Seoul, Korea, 2001.
-
(2001)
The Fourth International Symposium on Advances in Abrasive Technology (ISAAT'2001)
-
-
Oh, H.S.1
Park, S.E.2
Jeong, S.M.3
Kim, S.S.4
Lee, H.L.5
-
12
-
-
0344349242
-
Development of an ultraprecision grinding machine for super-large and super-flat silicon wafers - Proposal of trigonal prism type pentahedral structure
-
April 13-16, 1998, Carmel-by-the-sea, CA, American Society for Precision Engineering
-
K. Abe, S. Okawa, Y. Koma, K. Arai, Development of an ultraprecision grinding machine for super-large and super-flat silicon wafers - proposal of trigonal prism type pentahedral structure, in: Proceedings of Silicon Machining - Spring Topical Meeting, April 13-16, 1998, Carmel-by-the-sea, CA, American Society for Precision Engineering, (1998) 113-116.
-
(1998)
Proceedings of Silicon Machining - Spring Topical Meeting
, pp. 113-116
-
-
Abe, K.1
Okawa, S.2
Koma, Y.3
Arai, K.4
-
13
-
-
7044261360
-
Development of an ultraprecision grinding machine with trigonal type pentahedral structure for 400mm silicon wafers
-
May 31-June 4, Bremen, Germany
-
K. Abe, T. Ishikawa, Y. Koma, K. Arai, M. Kitano, Development of an ultraprecision grinding machine with trigonal type pentahedral structure for 400mm silicon wafers, in: Proceedings of the 1st International Conference and General Meetings of the European Society of Precision Engineering and Nanotechnology, May 31-June 4, 1999, Bremen, Germany, pp. 16-19.
-
(1999)
Proceedings of the 1st International Conference and General Meetings of the European Society of Precision Engineering and Nanotechnology
, pp. 16-19
-
-
Abe, K.1
Ishikawa, T.2
Koma, Y.3
Arai, K.4
Kitano, M.5
-
14
-
-
7044236257
-
Superabrasive grinding process optimization through force measurement
-
November 10-15, 2001, Arlington, VA, American Society for Precision Engineering
-
B. Knapp, E. Marsh, R. Grejda, D. Schalcosky, Superabrasive grinding process optimization through force measurement, in: Proceedings of the Sixteen ASPE Annual Meeting, November 10-15, 2001, Arlington, VA, American Society for Precision Engineering, (2001) 58-61.
-
(2001)
Proceedings of the Sixteen ASPE Annual Meeting
, pp. 58-61
-
-
Knapp, B.1
Marsh, E.2
Grejda, R.3
Schalcosky, D.4
-
15
-
-
0040427126
-
Nanogrinder for high precision machining of silicon wafers
-
Konnemann G., Eichhorn H., Petzold R. Nanogrinder for high precision machining of silicon wafers. Industrial Diamond Review. 59:(580):1999;30-33.
-
(1999)
Industrial Diamond Review
, vol.59
, Issue.580
, pp. 30-33
-
-
Konnemann, G.1
Eichhorn, H.2
Petzold, R.3
-
16
-
-
0242696665
-
Precision grinding of semiconductor wafers
-
Hinzen H., Ripper B. Precision grinding of semiconductor wafers. Solid State Technology. 36:(8):1993;53-56.
-
(1993)
Solid State Technology
, vol.36
, Issue.8
, pp. 53-56
-
-
Hinzen, H.1
Ripper, B.2
-
17
-
-
38849198849
-
Abrasive machining of silicon
-
Tonshoff H.K., Schmieden W.V., Inasaki I., Konig W., Spur G. Abrasive machining of silicon. CIRP Annals - Manufacturing Technology. 39:(2):1990;621-630.
-
(1990)
CIRP Annals - Manufacturing Technology
, vol.39
, Issue.2
, pp. 621-630
-
-
Tonshoff, H.K.1
Schmieden, W.V.2
Inasaki, I.3
Konig, W.4
Spur, G.5
-
18
-
-
0034956314
-
Development of single step grinding system for large scale o 300 Si wafer: A total integrated fixed-abrasive
-
Eda H., Zhou L., Nakano H., Kondo R., Shimizu J. Development of single step grinding system for large scale o 300 Si wafer: A total integrated fixed-abrasive. CIRP Annals - Manufacturing Technology. 50:(1):2001;225-228.
-
(2001)
CIRP Annals - Manufacturing Technology
, vol.50
, Issue.1
, pp. 225-228
-
-
Eda, H.1
Zhou, L.2
Nakano, H.3
Kondo, R.4
Shimizu, J.5
-
19
-
-
0035944453
-
A study of the total thickness variation in the grinding of ultra-precision substrates
-
Tso P.L., Teng C.C. A study of the total thickness variation in the grinding of ultra-precision substrates. Journal of Materials Processing Technology. 116:2001;182-188.
-
(2001)
Journal of Materials Processing Technology
, vol.116
, pp. 182-188
-
-
Tso, P.L.1
Teng, C.C.2
|