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Volumn 45, Issue 1, 2005, Pages 51-61

Fine grinding of silicon wafers: Machine configurations for spindle angle adjustments

Author keywords

Grinder; Grinding; Machine design; Machining; Semiconductor material; Silicon wafer

Indexed keywords

GRINDING (COMMINUTION); GRINDING MILLS; MACHINE DESIGN; MACHINING; SEMICONDUCTOR MATERIALS;

EID: 7044245722     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2004.06.013     Document Type: Article
Times cited : (32)

References (20)
  • 2
    • 7044273184 scopus 로고    scopus 로고
    • Silicon wafering process flow, U.S. Patent 6,294,469
    • M. Kulkarni, A. Desai, Silicon wafering process flow, U.S. Patent 6,294,469, 2001.
    • (2001)
    • Kulkarni, M.1    Desai, A.2
  • 3
    • 0035456947 scopus 로고    scopus 로고
    • A comparative study between total thickness variance and site flatness of polished silicon wafer
    • Oh H.S., Lee H.L. A comparative study between total thickness variance and site flatness of polished silicon wafer. Japanese Journal of Applied Physics, Part 1. 40:(9A):2001;5300-5301.
    • (2001) Japanese Journal of Applied Physics, Part 1 , vol.40 , Issue.9 A , pp. 5300-5301
    • Oh, H.S.1    Lee, H.L.2
  • 4
    • 0032659647 scopus 로고    scopus 로고
    • Materials quality and materials cost - Are they on a collision course?
    • Ravi K.V. Materials quality and materials cost - are they on a collision course? Solid State Phenomena. 69-70:1999;103-110.
    • (1999) Solid State Phenomena , vol.69-70 , pp. 103-110
    • Ravi, K.V.1
  • 5
    • 7044271623 scopus 로고    scopus 로고
    • Method of processing semiconductor wafers, U.S. Patent 6,114,245
    • R. Vandamme, Y. Xin, Z.J. Pei, Method of processing semiconductor wafers, U.S. Patent 6,114,245, 2000.
    • (2000)
    • Vandamme, R.1    Xin, Y.2    Pei, Z.J.3
  • 12
    • 0344349242 scopus 로고    scopus 로고
    • Development of an ultraprecision grinding machine for super-large and super-flat silicon wafers - Proposal of trigonal prism type pentahedral structure
    • April 13-16, 1998, Carmel-by-the-sea, CA, American Society for Precision Engineering
    • K. Abe, S. Okawa, Y. Koma, K. Arai, Development of an ultraprecision grinding machine for super-large and super-flat silicon wafers - proposal of trigonal prism type pentahedral structure, in: Proceedings of Silicon Machining - Spring Topical Meeting, April 13-16, 1998, Carmel-by-the-sea, CA, American Society for Precision Engineering, (1998) 113-116.
    • (1998) Proceedings of Silicon Machining - Spring Topical Meeting , pp. 113-116
    • Abe, K.1    Okawa, S.2    Koma, Y.3    Arai, K.4
  • 14
    • 7044236257 scopus 로고    scopus 로고
    • Superabrasive grinding process optimization through force measurement
    • November 10-15, 2001, Arlington, VA, American Society for Precision Engineering
    • B. Knapp, E. Marsh, R. Grejda, D. Schalcosky, Superabrasive grinding process optimization through force measurement, in: Proceedings of the Sixteen ASPE Annual Meeting, November 10-15, 2001, Arlington, VA, American Society for Precision Engineering, (2001) 58-61.
    • (2001) Proceedings of the Sixteen ASPE Annual Meeting , pp. 58-61
    • Knapp, B.1    Marsh, E.2    Grejda, R.3    Schalcosky, D.4
  • 15
    • 0040427126 scopus 로고    scopus 로고
    • Nanogrinder for high precision machining of silicon wafers
    • Konnemann G., Eichhorn H., Petzold R. Nanogrinder for high precision machining of silicon wafers. Industrial Diamond Review. 59:(580):1999;30-33.
    • (1999) Industrial Diamond Review , vol.59 , Issue.580 , pp. 30-33
    • Konnemann, G.1    Eichhorn, H.2    Petzold, R.3
  • 16
    • 0242696665 scopus 로고
    • Precision grinding of semiconductor wafers
    • Hinzen H., Ripper B. Precision grinding of semiconductor wafers. Solid State Technology. 36:(8):1993;53-56.
    • (1993) Solid State Technology , vol.36 , Issue.8 , pp. 53-56
    • Hinzen, H.1    Ripper, B.2
  • 18
    • 0034956314 scopus 로고    scopus 로고
    • Development of single step grinding system for large scale o 300 Si wafer: A total integrated fixed-abrasive
    • Eda H., Zhou L., Nakano H., Kondo R., Shimizu J. Development of single step grinding system for large scale o 300 Si wafer: A total integrated fixed-abrasive. CIRP Annals - Manufacturing Technology. 50:(1):2001;225-228.
    • (2001) CIRP Annals - Manufacturing Technology , vol.50 , Issue.1 , pp. 225-228
    • Eda, H.1    Zhou, L.2    Nakano, H.3    Kondo, R.4    Shimizu, J.5
  • 19
    • 0035944453 scopus 로고    scopus 로고
    • A study of the total thickness variation in the grinding of ultra-precision substrates
    • Tso P.L., Teng C.C. A study of the total thickness variation in the grinding of ultra-precision substrates. Journal of Materials Processing Technology. 116:2001;182-188.
    • (2001) Journal of Materials Processing Technology , vol.116 , pp. 182-188
    • Tso, P.L.1    Teng, C.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.