Toroidal Inductors for Radio-Frequency Integrated Circuits

IEEE Transactions on Microwave Theory and Techniques

Volumn 52, Issue 2, 2004, Pages 646-654

  Liu, Wai Y ^a,b   Suryanarayanan, Jayanthi ^c   Nath, Jayesh ^c   Mohammadi, Saeed ^d   Katehi, Linda P B ^d   Steer, Michael B ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b North Carolina State University ^*  (United Kingdom)

^c North Carolina State University   (United States)

^d PURDUE UNIVERSITY   (United States)

Author keywords

Inductor; Microniachining; Monolithic microwave integrated circuit (MMIC); Radio frequency integrated circuit (RFIC); Toroidal inductor

Indexed keywords

CAPACITANCE; EDDY CURRENTS; INDUCTANCE; MAGNETIC FLUX; MATHEMATICAL MODELS; METALLIZING; MICROMACHINING; POWER INDUCTORS; SEMICONDUCTING GALLIUM ARSENIDE; SILICON WAFERS; SUBSTRATES;

INDUCTORS; RADIO-FREQUENCY INTEGRATED CIRCUITS (RFIC); TOROIDAL INDUCTORS;

MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;

EID: 1342329289     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMTT.2003.822019     Document Type: Article

References (32)

1. F. Mernyei, F. Darrer, M. Pardoen, and A. Sibrai, "Reducing the substrates losses of RF integrated inductors," IEEE Microwave Guided Wave Lett, vol. 8, pp. 300-301, Sept. 1998.
2. I. J. Bahl, "High current handing capacity multilayer inductors for RF and microwave circuits," Int. J. RF Microwave Computer-Aided Eng., vol. 10, no. 2, pp. 139-146, Mar. 2000.
3. J. N. Burghartz, M. Soyuer, K. A. Jenkins, and D. Hulvey, "High-Q inductors in standard silicon interconnect technologies and its application to an integrated RF power amplifier," in Int. Electron Devices Meeting Tech. Dig., 1995, pp. 1015-1017.
4. T. C. Edwards and M. B. Steer, "Interconnects and filters in passive RFIC's and MICs," in Foundations of Interconnect and Microstrip Design. New York: Wiley, 2000, ch. 10.
5. R. Dekker, P. Baltus, M. van Deurzen, W. v. d. Einden, H. Maas, and A. Wagemans, "An ultra low-power RF bipolar technology on glass," in Int. Electron Devices Meeting Tech. Dig., 1997, pp. 921-923.
6. M. Park, C. S. Kim, J. M. Park, H. K. Yu, and K. S. Nam. "High Q microwave inductors in CMOS double-metal technology and its substrate bias effects for 2 GHz RF ICS application," in Int. Electron Devices Meeting Tech. Dig., 1997. pp. 59-62.
7. H. Jiang, Y. Wang, A. J.-L. Tien, and N. C. Tien, "Fabrication of high performance on-chip suspended spiral inductors by micromachining and electroless copper plating," in IEEE MTT-S Int. Microwave Symp. Dig., June 2000, pp. 279-282.
8. R. Volant, J. Malinowski, S. Subbanna, and E. Begle, "Fabrication of high frequency passives on BiCMOS silicon substrates," in IEEE MTT-S Int. Microwave Symp. Dig., June 2000, pp. 209-212.
9. V. Ermolov, H. Nieminen, K. Nybergh, T. Ryhänen, and S. Silanto, "MEMS for mobile communication," presented at the Circuits Assembly, May 2002.
10. J. Suryanarayanan, W. Y. Liu, J. Nath, B. N. Johnson, S. Mohammadi, L. P. B. Katehi, and M. B. Steer, "Toroidal inductors for integrated radio frequency and microwave circuits," in IEEE RF Integrated Circuits Symp., June 2003, pp. 607-610.
11. C. H. Ahn, Y. J. Kim, and M. G. Allen, "A fully integrated planar toroidal inductor with a micromachined nickel-iron magnetic bar," IEEE Trans. Comp., Packag., Manufact. Technol. A, vol. 17, pp. 463-469, Sept. 1994.
12. C. H. Ahn and M. G. Allen, "A new toroidal-meander type integrated inductor with a multilevel meander magnetic core," IEEE Trans. Magn., pp. 73-79, Jan. 1994.
13. _, "Micromachined planar inductors on silicon wafers for MEMS applications," IEEE Trans. Ind. Electron., vol. 45, pp. 866-876. Dec. 1998.
14. A. L. L. Pun, J. Tau, J. R. Clement, and D. K. Su, "Substrate noise coupling through planar spiral inductor," IEEE J. Solid-State Circuits, vol. 33, pp. 877-884, June 1998.
15. J. Craninickx and M. S. J. Steyaert, "A 1.8-GHz low-phase-noise CMOS VCO using optimized hollow spiral inductors," IEEE J. Solid-State Circuits, pp. 736-744, May 1997.
16. Y. Sun, H. van Zeijl, J. L. Tauritz, and R. G. F. Baets, "Suspended membrane inductors and capacitors for application in silicon MMIC's," in IEEE MTT-S Int. Microwave Symp. Dig., June 1996, pp. 99-102.
17. J. Y.-C. Chang, A. A. Abidi, and M. Gaitan, "Large suspended inductors on silicon and their use in a 2-μm CMOS RF amplifier," IEEE Electron Device Lett., vol. 14, pp. 246-248, May 1993.
18. C.-M. Nam and Y.-S. Kwon, "High-performance planar inductor on thick oxidized porous silicon (OPS) substrate," IEEE Microwave Guided Wave Lett., vol. 7, pp. 236-238, Aug. 1997.
19. D. J. Young, V. Malba, J.-J. Ou, A. F. Bernhardt, and B. E. Boser, "Monolithic high-performance three-dimensional coil inductors for wireless communication applications," in Int. Electron Devices Meeting Tech. Dig., Dec. 1997, pp. 67-70.
20. J.-B. Yoon, C.-H. Han, E. Yoon, and C.-K. Kim, "High-performance electroplated solenoid-type integrated inductor (SF) for RF applications using simple 3D surface micromachining technology," in Int. Electron Devices Meeting Tech. Dig., vol. 20, Sept. 1999, pp. 487-489.
21. Y. E. Chen, Y. K. Yoon, J. Laskar, and M. Allen, "A 2.4 GHz integrated CMOS power amplifier with micromachined inductors," in IEEE MTT-S Int. Microwave Symp. Dig., June 2001, pp. 523-526.
22. B.-K. Kim, B.-K. Ko, and K. Lee, "Monolithic planar RF inductor and waveguide structures on silicon with performance comparable to those in GaAs MMIC," in Int. Electron Devices Meeting Tech. Dig., Dec. 1995, pp. 717-720.
23. J. W. M. Rogers, V. Levenets, C. A. Pawlowicz, N. G. Tarr, T. J. Smy, and C. Plett, "Post-processed Cu inductors with application to a completely integrated 2-GHz VCO," IEEE Trans. Electron Devices, vol. 48, pp. 1284-1287, June 2001.
24. J. Y. Park and M. G. Allen, "High Q spiral-type microinductors on silicon substrates," IEEE Trans. Magn., vol. 35, pp. 3544-3546, Sept. 1999.
25. J.-B. Yoon, C.-H. Han, E. Yoon, and C.-K. Kim, "Monolithic high-Q overhang inductors fabricated on silicon and glass substrates," in Int. Electron Devices Meeting Tech. Dig., Dec. 1999, pp. 753-756.
26. J.-B. Yoon, Y.-S. Choi, Y. Eo, and E. Yoon, "CMOS-compatible, surface micromachined, suspended spiral inductors on standard silicon for multi-GHz silicon RF IC's," IEEE Electron Device Lett., vol. 23, pp. 591-593, Oct. 2002.
27. H.-S. Kim, D. Zheng, A. J. Becker, and Y. H. Xie, "Spiral inductors on Si P/P+ substrates with resonant frequency of 20 GHz," IEEE Electron Device Lett., vol. 22, pp. 275-277, June 2001.
28. W. H. Hayt, Engineering Electromagnetics, 4th ed. New York: MCGraw-Hill, 1981, pp. 328-333.
29. F. W. Grover, Inductance Calculations: Working Formulas and Tables. New York: Dover, 1946.
30. R. F. Harrington, Introduction to Electromagnetic Engineering, 1st ed. New York: MCGraw-Hill, 1958, pp. 254-255.
31. J.-S. Ko, B.-K. Kim, and K. Lee, "Simple modeling of coplanar waveguide on thick dielectric over lossy substrate." IEEE Trans. Electron Devices, vol. 44, pp. 856-861, May 1997.
32. G. Grandi, M. K. Kazimierczuk, A. Massarini, and U. Reggiani, "Stray capacitances of single-layer solenoid air-core inductors," IEEE Trans. Ind. Applicat., vol. 35, pp. 1162-1167, Sept.-Oct. 1999.