CMOS-compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs

IEEE Electron Device Letters

Volumn 23, Issue 10, 2002, Pages 591-593

  Yoon, Jun Bo ^a,b   Choi, Yun Seok ^b   Kim, Byeong Il ^b   Eo, Yunseong ^c   Yoon, Euisik ^a,b  

^a Korea Advanced Institute of Science and Technology ^*

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^c LG Electronics Inc   (South Korea)

Author keywords

High Q; Microelectromechanical systems (MEMS) inductor; On chip inductor; RF MEMS; Silicon RF IC; Surface micromachining; Suspended spiral inductor

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; INDUCTANCE; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; NATURAL FREQUENCIES; Q FACTOR MEASUREMENT; SEMICONDUCTING SILICON; SUBSTRATES;

ON-CHIP INDUCTOR; SURFACE MICROMACHINING; SUSPENDED SPIRAL INDUCTORS;

ELECTRIC INDUCTORS;

EID: 0036805474     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2002.803767     Document Type: Article

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