Growth of lanthanum oxide thin films by liquid injection MOCVD using a novel lanthanum alkoxide precursor

Chemical Vapor Deposition

Volumn 10, Issue 1, 2004, Pages 13-17

  Aspinall, Helen C ^a   Gaskell, Jeffrey ^a   Williams, Paul A ^b   Jones, Anthony C ^a   Chalker, Paul R ^a   Marshall, Paul A ^a   Smith, Lesley M ^b   Critchlow, Gary W ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Oxides and Nitrides   (United Kingdom)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; COMPOSITION; FILM GROWTH; LANTHANUM COMPOUNDS; LOW TEMPERATURE EFFECTS; PYROLYSIS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; THIN FILMS;

GROWTH RATE; LANTHANUM ALKOXIDE PRECURSOR; LANTHANUM OXIDE; LIQUID INJECTION;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 1242333104     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200304164     Document Type: Article

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