A soft-imprint technique for direct fabrication of submicron scale patterns using a surface-modified PDMS mold

Microelectronic Engineering

Volumn 70, Issue 1, 2003, Pages 131-136

  Choi, Won Mook ^a   Park, O Ok ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Microfabrication; Modified PDMS mold; Soft imprint; Teflon AF

Indexed keywords

ELASTOMERS; MONOMERS; POLYMERIZATION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SURFACE TREATMENT;

POLYMER STRUCTURES;

MICROELECTRONIC PROCESSING;

EID: 0141642246     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00436-2     Document Type: Article

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