Formation of cubic boron nitride thin films using ECR plasma enhanced CVD

Diamond and Related Materials

Volumn 9, Issue 7, 2000, Pages 1336-1341

  Ye, M ^a   Delplancke Ogletree, M P ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

Adhesion; Cubic boron nitride; Deposition; Surface roughness

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CUBIC BORON NITRIDE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; STEEL; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ION DENSITY; LANGMUIR PROBE;

THIN FILMS;

EID: 0033686090     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(00)00257-0     Document Type: Article

References (18)

1. Vel L., Demazeau G., Etourneau J. Mater. Sci. Eng. A139:1991;284.
2. Mirkarimi P.B., McCarty K.F., Medlin D.L. Mater. Sci. Eng. R21:1997;47.
3. Kester D.J., Messier R. J. Appl. Phys. 72:1992;504.
4. Yamada Y., Tatebayashi Y., Tsuda O., Yoshida T. Thin Solid Films. 295:1997;137.
5. Kuhr M., Reinke S., Kulisch W. Surf. Coat. Technol. 74-75:1995;806.
6. Weissmantel S., Reisse G., Keiper B., Weber A., Falke U., Röder M. Appl. Surf. Sci. 127-129:1998;444.
7. Chayahara A., Yokoyama H., Imura T., Osaka Y. Jpn. J. Appl. Phys. 26:1987;L1435.
8. Weber A., Bringmann U., Nikulski R., Klages C.-P. Diamond Relat. Mater. 2:1993;201.
9. Yoshida T. Diamond Relat. Mater. 5:1996;501.
10. Geick R., Penny C.H., Rupprecht G. Phys. Rev. 146:1996;543.
11. Gielisse P.J., Mitra S.S., Plendl J.N. et al. Phys. Rev. 155:1967;1039.
12. M.P. Delplancke-Ogletree, M. Ye, Presented at the AVS 46th International Symposium in Seattle, Washington, October 25-29, 1999.
13. Klotzbücher T., Pfleging W., Wesner D.A., Mergens M., Kreutz E.W. Diamond Relat. Mater. 5:1996;525.
14. Litvinov D., Clarke R. Appl. Phys. Lett. 74:1999;955.
15. Watanabe S., Miyake S., Zhou W., Ikuhara Y., Suzuki T., Murakawa M. Appl. Phys. Lett. 66:1995;1478.
16. Jankowski A.F., Hayes J.P., Makowiecki D.M., McKernan M.A. Thin Solid Films. 308-309:1997;94.
17. W. Kulisch, S. Reinke, R. Freudenstein, in: M. Kamo, T. Taniguchi, H. Yusa, H. Kanda, S. Koizumi, Y. Matsui, T. Aizawa, M. Kobayashi, K. Seki (Eds.), Advanced Materials' 98, NIRIM, Tsukuba, Japan, 1998, p. 63.
18. Stoney G. Proc. R. Soc. Lond. A. 82:1909;172.