Synthesis of boron nitride films by microwave plasma chemical vapor deposition in fluorine-containing gases

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 6 A, 2001, Pages

  Matsumoto, Seiichiro ^a   Zhang, Wenjun ^a,b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

cBN film; Cubic boron nitride; Fluorine; Microwave plasma; Plasma CVD; Raman spectra

Indexed keywords

CUBIC BORON NITRIDE; FILM GROWTH; FLUORINE COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; X RAY DIFFRACTION;

BORON NITRIDE FILMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0035358439     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l570     Document Type: Article

References (14)