High rep rate high performance plasma focus as a powerful radiation source

IEEE Transactions on Plasma Science

Volumn 26, Issue 4, 1998, Pages 1119-1126

  Lee, Sing ^a   Lee, Paul ^a   Zhang, Guixin ^a   Feng, Xianping ^a   Gribkov, Vladimir A ^a   Liu, Mahe ^a   Serban, Adrian ^a   Wong, Terence K S ^a   Lee, S ^a   Lee, P ^a   Zhang, G ^a   Feng, X ^a   Liu, M ^a   Serban, A ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Lithography; Plasma focus; X ray

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; NEUTRON SOURCES; X RAY LITHOGRAPHY; X RAY PRODUCTION;

PLASMA FOCUS DEVICES; X RAY SOURCES;

PLASMA DEVICES;

EID: 0032136378     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.725141     Document Type: Article

References (15)

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