Pinch plasmas as intense EUV sources for laboratory applications

Optical and Quantum Electronics

Volumn 28, Issue 3, 1996, Pages 241-259

  Lebert, R ^a   Rothweiler, D ^b   Engel, A ^a   Bergmann, K ^a   Neff, W ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IONS; LASER PRODUCED PLASMAS; PHOTONS; PINCH EFFECT; PLASMA DEVICES; ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY; X RAY MICROSCOPES;

EXTREME ULTRAVIOLET RADIATION; PINCH PLASMAS;

PLASMAS;

EID: 0030108060     PISSN: 03068919     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00385856     Document Type: Article

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