Deposition mechanism of sputtered amorphous carbon nitride thin film

Applied Surface Science

Volumn 223, Issue 4, 2004, Pages 269-274

  Durand Drouhin, O ^a   Benlahsen, M ^a   Clin, M ^a   Bouzerar, R ^a  

^a Universite de Picardie Jules Verne   (France)

Author keywords

Atom; Disordered systems; Ion impact; Molecule; Surface and interfaces; Thin films

Indexed keywords

AMORPHOUS FILMS; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; PLASMAS; THIN FILMS;

DISORDERED SYSTEMS; NUCLEAR REACTION ANALYSIS (NRA);

SPUTTER DEPOSITION;

EID: 0347603493     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.09.017     Document Type: Article

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