Characterization of PLZT thin film prepared by photochemical deposition using photosensitive metal-organic precursors

Microelectronic Engineering

Volumn 71, Issue 2, 2004, Pages 215-220

  Park, Hyeong Ho ^a   Kim, Woo Sik ^a   Yang, Jun Kyu ^a   Park, Hyung Ho ^a   Hill, Ross H ^b  

^a Yonsei University   (South Korea)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Photochemical reaction; PLZT; PZT; Self patterning; UV exposure

Indexed keywords

ELECTRIC POTENTIAL; FERROELECTRIC MATERIALS; LEAKAGE CURRENTS; ORGANOMETALLICS; PHOTOCHEMICAL REACTIONS; PHOTOSENSITIVITY; POLARIZATION; SEMICONDUCTOR DOPING; THIN FILMS; ULTRAVIOLET RADIATION;

AMELIORATION; SELF PATTERNING;

LANTHANUM COMPOUNDS;

EID: 0346341027     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2003.11.004     Document Type: Article

References (29)

1. Singh R., Alamgir S., Sharangpani R. Appl. Phys. Lett. 67:1995;3939.
2. Tseng T.-F., Liu K.-S., Wu T.-B., Lin I.-N. Appl. Phys. Lett. 68:1996;2505.
3. Majumder S.B., Roy B., Katiyar R.S., Krupanidhi S.B. Appl. Phys. Lett. 79:2001;239.
4. Soyer C., Cattan E., Remiens D., Guilloux-Viry M. J. Appl. Phys. 92:2002;1048.
5. Lee J.K., Kim T.-Y., Chung I., Desu S.B. Appl. Phys. Lett. 75:1999;334.
6. Chung C.W., Kim C.J. Jpn. J. Appl. Phys. 36:1997;2747.
7. Gao M., Hill R.H. J. Mater. Res. 13:1998;1379.
8. Chu C.W., Hill R.H. Mater. Chem. Phys. 43:1996;135.
9. Avey A.A., Hill R.H. J. Am. Chem. Soc. 118:1996;237.
10. Law W.L., Hill R.H. Thin Solid Films. 375:2000;42.
11. Yang B., Song T.K., Aggarwal S., Ramesh R. Appl. Phys. Lett. 71:1997;3578.
12. Boyle T.J., Clem P.G., Tuttle B.A., Brennecka G.L., Dawley J.T., Rodriguez M.A., Dunbar T.D., Hammetter W.F. J. Mater. Res. 17:2002;871.
13. Boerasu I., Pintilie L., Kosec M. Appl. Phys. Lett. 77:2000;2231.
14. Sudhama C., Kim J., Lee J., Chikarmane V., Shepherd W., Myers E.R. J. Vac. Sci. Technol. B. 11(4):1993;1302.
15. Kim S.-H., Woo H.-J., Ha J., Hwang C.S., Kim H.R., Kingon A.I. Appl. Phys. Lett. 78:2001;2885.
16. Xu F., Trolier-Mckinstry S., Ren W., Xu B. J. Appl. Phys. 89:2001;1336.
17. Es-Souni M., Abed M., Piorra A., Malinowski S., Zaporojtchenko V. Thin Solid Films. 389:2001;99.
18. Ha S.-M., Kim W.S., Park H.-H., Kim T.S. Ferroelectrics. 273:2002;35.
19. Chen S.Y., Chen I.W. J. Am. Ceram. Soc. 81:1998;97.
20. Zou Q., Ruda H., Yacobi B.G., Farrell M. Thin Solid Films. 402:2002;65.
21. Poosanaas P., Uchino K. Mater. Chem. Phys. 61:1999;36.
22. Adachi H., Mitsuyu T., Yamazaki O., Wasa K. J. Appl. Phys. 60(2):1986;736.
23. Chang J.-F., Desu S.B. J. Mater. Res. 9:1994;955.
24. Yang J.-K., Kim W.S., Park H.-H. Thin Solid Films. 377-378:2000;739.
25. Stolichnov I., Tagantsev A., Setter N., Okhonin S., Fazan P., Cross J.S., Tsukada M. J. Appl. Phys. 87:2000;1925.
26. Joo J.-H., Seon J.-M., Jeon Y.-C., Oh K.-Y., Roh J.-S., Kim J.-J. Appl. Phys. Lett. 70:1997;3053.
27. Hong J., Song H.W., Lee H.C., Lee W.J., No K. J. Appl. Phys. 90:2001;1962.
28. Kim S.-H., Kim D.-J., Hong J., Streiffer S.K., Kingon A.I. J. Mater. Res. 14:1999;1371.
29. Mah S.B., Jang N.W., Jang J.H., Park J.H., Paik D.S., Park C.Y. Mater. Res. Bull. 35:2000;1113.