|
Volumn 43, Issue 3, 2000, Pages
|
CMOS: how far can it go?
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRIC POTENTIAL;
MICROELECTRONICS;
MOSFET DEVICES;
SEMICONDUCTOR DOPING;
SILICA;
SILICON ON INSULATOR TECHNOLOGY;
SUBSTRATES;
DIRECT TUNNELING;
GATE DIELECTRIC ENGINEERING;
HIGH DOPING LEVELS;
VERTICAL TRANSISTORS;
CMOS INTEGRATED CIRCUITS;
|
EID: 0343953386
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
Times cited : (2)
|
References (37)
|