Ultra-thin gate oxides - performance and reliability

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 163-166

  Iwai, Hiroshi ^a   Momose, Hisayo Sasaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; INTEGRATED CIRCUIT TESTING; LEAKAGE CURRENTS; SEMICONDUCTOR DEVICE TESTING;

DIRECT-TUNNELING GATE OXIDES;

GATES (TRANSISTOR);

EID: 0032272375     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)