Correlation between bonding structure and mechanical properties of amorphous carbon nitride thin films

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 284-288

  Quiros C ^a   Nunez R ^a   Prieto, P ^a   Vergara, I ^b   Caceres D ^b   Soriano, L ^a   Fuentes, G G ^a   Elizalde, E ^a   Sanz, J M ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

Carbon nitride; Dual ion beam sputtering; FT IR; Hardness; XAS; XPS

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS TESTING; INORGANIC COMPOUNDS; ION BEAMS; MOLECULAR STRUCTURE; NITRIDES; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; DUAL ION BEAM SPUTTERING; NANOINDENTATION TESTS;

PROTECTIVE COATINGS;

CARBONITRIDING; CERAMIC COATING; HARDNESS; SPUTTERING;

EID: 0342313822     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00574-5     Document Type: Conference Paper

References (21)

1. Sjöstrom H., Stafström S., Boman M., Sundgren J.-E. Phys. Rev. Lett. 75:1995;1336.
2. Li D., Cutiongco E., Chung Y.-W., Wong M.-S., Sproul W.D. Surf. Coat. Technol. 68-69:1994;611.
3. Kohzaki M., Matsumuro A., Hayashi T., Muramatsu M., Yamaguchi K. Thin Solid Films. 308-309:1997;239.
4. Chan W.-C., Zhou B., Chung Y.-W., Lee C.S., Lee S.T. J. Vac. Sci. Technol. A. 16:1998;1907.
5. Marton D., Boyd K.J., Al-Bayati A.H., Todorov S.S., Rabalais J.W. Phys. Rev. Lett. 73:1994;118.
6. Sjöstrom H., Hultman L., Sundgren J.-E., Hainsworth S.V., Page T.F., Theunissen G.S.A.M. J. Vac. Sci. Technol. A. 14:1996;56.
7. Tabbal M., Mérel P., Moisa S., Chaker M., Ricard A., Moisan M. Appl. Phys. Lett. 69:1996;1698.
8. Lopez S., Dunlop H.M., Benmalek M., Tourillon G., Wong M.-S., Sproul W.D. Surf. Interface Anal. 25:1997;827.
9. Hammer P., Baker M.A., Lenardi C., Gissler W. J. Vac. Sci. Technol. A. 15:1997;107.
10. Zhao X.-A., Ong C.W., Tsang Y.C., Wong Y.W., Chan P.W., Choy C.L. Appl. Phys. Lett. 66:1995;2652.
11. Ogata K., Chubaci J.F.D., Fujimoto F. J. Appl. Phys. 76:1994;3791.
12. Taki Y., Kitagawa T., Takai O. Thin Solid Films. 304:1997;183.
13. McCulloch D.G., Merchant A.R. Thin Solid Films. 290-291:1996;99.
14. Holloway B.C., Shuh D.K., Kelly M.A., Tong W., Carlisle J.A., Jimenez I., Sutherland D.G.J., Terminello L.J., Pianetta P., Hagstrom S. Thin Solid Films. 290-291:1996;94.
15. Brydson R., Sauer H., Engel W., Thomas J.M., Zeitler E., Kosugi N., Kuroda H. J. Phys.: Condens. Matter. 1:1989;797.
16. Oliver W.C., Pharr G.M. J. Mater. Res. 7:1992;1564.
17. W.C. Oliver and J.B. Pethica, U.S. Patent No. 4 848 141 (1989).
18. Hammer P., Baker M.A., Lenardi C., Gissler W. Thin Solid Films. 290-291:1996;107.
19. Zhu Q., Money S.L., Russell A.E., Thomas K.M. Langmuir. 13:1997;2149.
20. Pels J.R., Kapteijn F., Moulijn J.A., Zhu Q., Thomas K.M. Carbon. 33:1995;1641.
21. Donnet C., Martin J.M., Fontaine J., Sánchez-López J.C., Quirós C., Elizalde E., Sanz J.M., Rojas T.C., Fernandez A. Surf. Coat. Technol. 120-121:1999;594.