Tribological properties of self-assembled monolayers on Au, SiOx and Si surfaces

Tribology Letters

Volumn 10, Issue 1-2, 2001, Pages 97-101

  Kim, Hyun I ^a   Boiadjiev, V ^b   Houston, J E ^a   Zhu, X Y ^b   Kiely, J D ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF MINNESOTA   (United States)

^c SEAGATE RESEARCH   (United States)

Author keywords

IFM; Self assembled monolayers; Silicon substrate; Tribology

Indexed keywords

EID: 0003087910     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1009014010006     Document Type: Article

References (34)

1. K. Deng, R.J. Collins, M. Mehregany and C.N. Sukenik, J. Electrochem. Soc. 142 (1995) 1278.
2. U. Srinivasan, M.R. Houston, R.T. Howe and R. Maboudian, J. Microelectromechanical Systems 7 (1998) 252.
3. M.P. de Boer, J.A. Knapp and T.A. Michalske, Acta Mater. (2000), in press.
4. N.G. Cave and A.J. Kinlock, Polymer 33 (1992) 162.
5. W.F. Bergerson, J.A. Mulder, R.P. Hsung and X.-Y. Zhu, J. Am. Chem. Soc. 121 (1999) 454.
6. C.A. Widrig, C.A. Alves and M.D. Porter, J. Am. Chem. Soc. 113 (1991) 2805.
7. N. Camillone III, T.Y.B. Leung and G. Scoles, Surf. Sci. 373 (1997) 333.
8. L. Strong and G.M. Whitesides, Langmuir 4 (1988) 546.
9. C.A. Alves, E.L. Smith and M.D. Porter, J. Am. Chem. Soc. 114 (1992) 1222.
10. G.Y. Liu and M.B. Salmeron, Langmuir 10 (1994) 367.
11. A. Lio, D.H. Charych and M. Salmeron, J. Phys. Chem. B 101 (1997) 3800.
12. X. Xiao, J. Hu, D.H. Charych and M. Salmeron, Langmuir 12 (1996) 235.
13. E. Barrena, S. Kopta, D.F. Ogletree, D.H. Charych and M. Salmeron, Phys. Rev. Lett. 82 (1999) 2880.
14. S.A. Joyce and J.E. Houston, Rev. Sci. Instrum. 62 (1991) 710.
15. J. Halling, Introduction to Tribology (Wykeham, London, 1976).
16. U. Demir and C. Shannon, Langmuir 10 (1994) 2794.
17. S.R. Wasserman, Y-T. Tao and G.M. Whitesides, Langmuir 5 (1989) 1074.
18. X.-Y. Zhu and J.E. Houston, Tribol. Lett. 7 (1999) 87.
19. J.D. Kiely, J.E. Houston, J.A. Mulder, R.P. Hsung and X.-Y. Zhu, Tribol. Lett. 7 (1999) 103.
20. J.D. Kiely and J.E. Houston, Langmuir 15 (1999) 4513.
21. Y. Zhang, R.H. Terrill, T.A. Tanzer and P.W. Bohn, J. Am. Chem. Soc. 120 (1998) 2654.
22. K.L. Norrod and K.L. Rowlen, J. Am. Chem. Soc. 120 (1998) 2656.
23. A.B. Horm, D.A. Russell, L.J. Shorthouse and T.R.E. Simpson, J. Chem. Soc., Faraday Trans. 92 (1996) 4759.
24. M.J. Tarlov, D.R.F. Burgess, Jr. and G. Gillen, J. Am. Chem. Soc. 115 (1993) 5305.
25. M.H. Dishner, F.J. Feher and J.C. Hemminger, J. Chem. Soc. Chem. Commun. 16 (1996) 1971.
26. R. Maboudian, Surf. Sci. Rep. 30 (1998) 207.
27. A. Ulman, Chem. Rev. 96 (1996) 1533.
28. M. Stevens, Langmuir 15 (1999) 2773.
29. E.P. Pleuddemann, J. Adhes. Adhesives 1 (1981) 305.
30. X.-Y. Zhu, unpublished (2000).
31. M.P. de Boer and T.A. Michalske, J. Appl. Phys. 86 (1999) 817.
32. X.-Y. Zhu, V. Boiadjiev, J.A. Mulder, R.P. Hsung and R.C. Major, submitted (2000).
33. M.R. Linford, P. Fenter, P.M. Eisenberger and C.E.D. Chidsey, J. Am. Chem. Soc. 117 (1995) 3145.
34. X.-Y. Zhu, J.A. Mulder and W.F. Bergerson, Langmuir 15 (1999) 814.