Model for predicting preferential orientation of chemical-vapor-deposited films

Journal of the Electrochemical Society

Volumn 147, Issue 4, 2000, Pages 1440-1442

  Nishioka, Kunikazu ^a   Mizutani, Nobutaka ^a   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; TEMPERATURE;

DIPIVALOYMETHANATO; RANDOM ORIENTATION; SURFACE GROWTH;

MATHEMATICAL MODELS;

EID: 0033742854     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393374     Document Type: Article

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