Emissivity measurements and modeling of silicon-related materials: An overview

International Journal of Thermophysics

Volumn 22, Issue 5, 2001, Pages 1593-1611

  Ravindra, N M ^a   Sopori, B ^b   Gokce, O H ^a   Cheng, S X ^a   Shenoy, A ^a   Jin, L ^a   Abedrabbo, S ^a,c   Chen, W ^a,b,d   Zhang, Y ^a,b  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^c JDS UNIPHASE   (United States)

^d BTA Technology Inc   (United States)

Author keywords

Coatings; Concentration; Doping concentration; Emissivity; Silicon; Surface roughness; Temperature; Wavelength

Indexed keywords

EID: 0242310789     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012869710173     Document Type: Article

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