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Volumn 28, Issue 12, 1999, Pages 1385-1389

Calculation of emissivity of Si wafers

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COMPUTER SOFTWARE; ENERGY GAP; LIGHT ABSORPTION; LIGHT EMISSION; LIGHT INTERFERENCE; LIGHT POLARIZATION; MATHEMATICAL MODELS; MORPHOLOGY; REFRACTIVE INDEX; SEMICONDUCTOR DOPING; THERMAL EFFECTS;

EID: 0033281334     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-999-0126-7     Document Type: Article
Times cited : (38)

References (12)
  • 1
    • 0027874762 scopus 로고
    • Pittsburgh, PA: MRS
    • Fred Roozeboom, MRS Symposium Proc. 303 (Pittsburgh, PA: MRS, 1993), p. 149.
    • (1993) MRS Symposium Proc. , vol.303 , pp. 149
    • Roozeboom, F.1
  • 3
    • 0001815364 scopus 로고    scopus 로고
    • ed. F. Roozeboom Dordrecht, The Netherlands: Kluwer Academic Publishers, The Netherlands
    • P.J. Timans, Advances in Rapid Thermal and Integrated Processing, ed. F. Roozeboom (Dordrecht, The Netherlands: Kluwer Academic Publishers, The Netherlands, 1996), p. 35.
    • (1996) Advances in Rapid Thermal and Integrated Processing , pp. 35
    • Timans, P.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.