Perspectives on emissivity measurements and modeling in silicon

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 187-193

  Abedrabbo, S ^a   Hensel, J C ^a   Fiory, A T ^b   Sopori, B ^c   Chen, W ^a,c   Ravindra, N M ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038214805     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00028-6     Document Type: Article

References (9)

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4. Ravindra NM, Abedrabbo S, Chen W, Tong FM, Nanda AK, Speranza T. IEEE Trans. Semicond. Manuf. 1998;Feb:30-9.
5. Ravindra NM, Tong FM, Schmidt W, Chen W, Abedrabbo S, Nanda A, Speranza T, Tello AM. ISSM'96, Tokyo, Japan. 1996;Oct.:101-4.
6. Born M., Wolf E., Principles of optics, Chap. 8.3, 4th ed., Pergamon Press, 1970. p. 381.
7. Ravindra N.M., Abedrabbo S., Gokce O.H., Tong F.M., Patel A., Rajasekhar V., Williamson G., Maszara W., IEEE Trans. Components Packaging Manuf. Technol., 1998; Sept.;21:441-9.
8. Measurements of roughness performed at Burleigh Instruments, April, 1998.
9. Abedrabbo S., Hensel J.C., Gokce O.H., Tong F.M., Sopori B., Fiory A.T., Ravindra N.M., Mat. Res. Soc. Proc., 1998;525:95-102.