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Volumn 429, Issue , 1996, Pages 3-14
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Role of thermal radiative properties of semiconductor wafers in rapid thermal processing
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Author keywords
[No Author keywords available]
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Indexed keywords
CALCULATIONS;
HEAT RADIATION;
HEAT TRANSFER;
MATHEMATICAL MODELS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICES;
SILICON WAFERS;
TEMPERATURE MEASUREMENT;
OPTICAL MODELS;
PROCESS REPEATABILITY;
RAPID THERMAL PROCESSING;
SEMICONDUCTOR WAFER;
THERMAL RADIATIVE PROPERTIES;
THERMODYNAMIC PROPERTIES;
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EID: 0030393149
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-429-3 Document Type: Conference Paper |
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Times cited : (15)
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References (36)
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