Pattern uniformity control in room-temperature imprint lithography

Applied Physics Letters

Volumn 83, Issue 12, 2003, Pages 2441-2443

  Hong, Pil S ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTICITY; ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; POLYSTYRENES; SILICON WAFERS; STRAIN HARDENING; THERMAL EFFECTS;

PATTERNING TECHNOLOGY;

PLASTIC MOLDS;

EID: 0142090041     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1613363     Document Type: Article

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