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Volumn 77, Issue 17, 2000, Pages 2683-2685

Boron diffusion in silicon in the presence of other species

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EID: 0142047690     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1320019     Document Type: Article
Times cited : (11)

References (23)
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    • edited by J. H. Crawford, Jr. and L. M. Slifkin (Plenum, New York)
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    • Casey Jr., H.C.1    Pearson, G.L.2
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    • A. Agarwal, H.-J. Gossmann, D. J. Eaglesham, S. B. Herner, A. T. Fiory, and T. E. Haynes, Appl. Phys. Lett. 74, 2435 (1999); A. Agarwal, H.-J. Gossmann, and D. J. Eaglesham, ibid. 74, 2331 (1999).
    • (1999) Appl. Phys. Lett. , vol.74 , pp. 2331
    • Agarwal, A.1    Gossmann, H.-J.2    Eaglesham, D.J.3
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    • J. Zhu, T. Diaz de la Rubia, L. H. Yang, C. Mailhoit, and G. H. Gilmer, Phys. Rev. B 54, 4741 (1996); J. Zhu, Comput. Mater. Sci. 12, 309 (1998).
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    • G. Kresse and J. Hafner, Phys. Rev. B 47, 558 (1993); 49, 14251 (1994); 54, 11169 (1996).
    • (1996) Phys. Rev. B , vol.54 , pp. 11169


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