Suppressed diffusion of boron and carbon in carbon-rich silicon

Applied Physics Letters

Volumn 73, Issue 12, 1998, Pages 1682-1684

  Rucker H ^a   Heinemann, B ^a   Ropke W ^a   Kurps, R ^a   Kruger D ^a   Lippert, G ^a   Osten, H J ^a  

^a IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000077773     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122244     Document Type: Article

References (14)

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