Calculation of the fractional interstitial component of boron diffusion and segregation coefficient of boron in Si0.8Ge0.2

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 791-793

  Fang, Tilden T ^a   Fang, Wingra T C ^a   Griffin, Peter B ^a   Plummer, James D ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001567124     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116534     Document Type: Article

References (19)

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