Nucleation and grain growth of SrBi2Nb2O9 thin films

Journal of Crystal Growth

Volumn 259, Issue 1-2, 2003, Pages 79-84

  Yoo, Dong Chul ^a   Lee, Jeong Yong ^a   Kim, Ik Soo ^b   Kim, Yong Tae ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

A1. Antiphase boundary; A1. High resolution transmission electron microscopy

Indexed keywords

ANNEALING; CRYSTALLIZATION; NUCLEATION; STRONTIUM COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ANTIPHASE BOUNDARY;

GRAIN GROWTH;

EID: 0141964085     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.07.008     Document Type: Article

References (21)

1. Solayappan N., Derbenwick G.F., McMillan L.D., Paz de Araujo C.A. Integr. Ferroelectron. 14:1997;237.
2. Yang C.H., Park S.S., Yoon S.G. J. Mater. Sci. 33:1998;2851.
3. Dat R., Lee J.K., Auciello O., Kingon A.I. Appl. Phys. Lett. 67:1995;572.
4. Ling H., Li A., Wu D., Yu T., Liu Z., Ming N. Mater. Lett. 49:2001;303.
5. Zhang Z.G., Liu J.S., Wang Y.N., Zhu J.S., Yan F., Chen X.B., Shen H.M. Appl. Phys. Lett. 73:1998;788.
6. Kang B.S., Park B.H., Bu S.D., Kang S.H., Noh T.W. Appl. Phys. Lett. 75:1999;2644.
7. Ishikawa K., Saiki A., Funakubo H. Jpn. J. Appl. Phys. 39:2000;2102.
8. Nukaga N., Mitsuya M., Suzuki T., Nishi Y., Fujimoto M., Funakubo H. Jpn. J. Appl. Phys. 40:2001;5595.
9. Franke K., Martin G., Weihnacht M., Sotnikov A.V. Solid State Comm. 119:2001;117.
10. Hyun S.J., Park B.H., Bu S.D., Jung J.H., Noh T.W. Appl. Phys. Lett. 73:1998;2518.
11. Volkov V., Vasco E., Duran-Martin P., Zaldo C. Appl. Phys. A. 69:1999;S833.
12. Duclere J.R., Viry M.G., Pen-in A., Clerc C., Lalu F., Lesueur J., Zanetti S.M., Bouquet V., Longo E. Int. J. Inorganic Mater. 3:2001;1133.
13. Boulle A., Legrand C., Guinebretiere R., Mercurio J.P., Dauger A. Thin Solid Films. 391:2001;42.
14. Du X., Chen I.W. J. Am. Ceram. Soc. 81:1998;3260.
15. Zhu X.H., Li A.D., Wu D., Zhu T., Liu Z.G., Ming N.B. Appl. Phys. Lett. 78:2001;973k.
16. Miura K. Appl. Phys. Lett. 80:2002;2967.
17. Yang W.S., Yeon S.J., Kim N.K., Keon S.Y., Roh J.S. Jpn. J. Appl. Phys. 39:2000;5465.
18. Tay S.T., Jiang X.H., Huan C.H.A., Wee A.T.S., Liu R. J. Appl. Phys. 88:2000;5928.
19. Zanetti S.M., Araujo E.B., Leite E.R., Longo E., Varela J.A. Mater. Lett. 40:1999;33.
20. Choi J.H., Lee J.Y., Kim Y.T. Appl. Phys. Lett. 74:1999;2933.
21. Wu D., Li A., Ling H., Yu T., Liu Z., Ming N. J. Appl. Phys. 87:2000;1795.