Growth of epitaxial SrBi2Ta2O9 thin films by metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 B, 2000, Pages 2102-2109

  Ishikawa, Katsuyuki ^a   Saiki, Atsushi ^a   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

(001) orientation; (116) orientation; Epitaxial; MOCVD; SrBi2Ta2O9

Indexed keywords

CRYSTAL ORIENTATION; FILM PREPARATION; FLUORESCENCE; FLUORSPAR; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PEROVSKITE; SINGLE CRYSTALS; STRONTIUM COMPOUNDS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY; ZIRCONIA;

ROCKSALT STRUCTURED; YTTRIA STABILISED ZIRCONIA;

EPITAXIAL GROWTH;

EID: 0033721763     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.2102     Document Type: Article

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