MxL: Pseudo-maskless, high-throughput nanolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 538-549

  Schaper, Charles D ^a  

^a Stanford University   (United States)

Author keywords

Imprint lithography; Maskless lithography; Nanolithography; Soft lithography

Indexed keywords

DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; PRINTING; SOLVENTS; SURFACE TOPOGRAPHY; THERMAL EXPANSION; THREE DIMENSIONAL;

MASKLESS LITHOGRAPHY; MOLECULAR TRANSFER LITHOGRAPHY; POLYDIMETHYLSILOXANE; SOFT LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0141724731     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484420     Document Type: Conference Paper

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