Top down versus cross sectional SEM metrology and its impact on lithography simulation calibration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 663-673

  Jones, Robert ^a   Byers, Jeffrey ^a   Conley, Will ^b  

^a KLA Tencor Austin   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Bias; CDSEM; Cross section; Lithography; Simulation; Top down

Indexed keywords

ALGORITHMS; COMPOSITION; COMPUTER SIMULATION; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

BIAS; CROSS SECTION; REPEATABILITY; TOP DOWN;

LITHOGRAPHY;

EID: 0141500235     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485041     Document Type: Conference Paper

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5. S. Bunrit, N. Covavisaruch, and B. Thipakorn, "Determining Surface Shape of SEM Images Using Non-Linear Shape from Shading Technique," Proc. Image Vision Computing New Zealand 2000, 316-21 (2000).