Electron cyclotron resonance plasma etching of GaSb in Cl 2/BCl3/CH4/Ar/H2 at room temperature

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1511-1512

  Langer, J P ^a   Dutta, P S ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; PARAMETER ESTIMATION; PHOTOVOLTAIC CELLS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TEMPERATURE CONTROL;

SIDEWALLS;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0141681223     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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