High-density inductively coupled plasma etching of GaAs/AIGaAs in BCl3/Cl2/Ar: A study using a mixture design experiment

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 511-514

  Agarwala, Sambhu ^a   Horst, Scott C ^a   King, Oliver ^a   Wilson, Rick ^a   Stone, Dennis ^a   Dagenais, Mario ^b   Chen, Y J ^c  

^a LABORATORY FOR PHYSICAL SCIENCES   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c UNIVERSITY OF MARYLAND BALTIMORE COUNTY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141671202     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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10. S. C. Horst, S. Agarwala, O. King, J. L. Fitz, and S. D. Smith, Appl. Phys. Lett. 71, 1444 (1997).