Experimental and theoretical study of two-dimensional ion flux uniformity at the wafer plane in inductively coupled plasmas

IEEE Transactions on Plasma Science

Volumn 31, Issue 4 II, 2003, Pages 614-627

  Kim, Tae Won ^a   Aydil, Eray S ^a  

^a Santa Barbara   (United States)

Author keywords

Chlorine plasma; Discharge modeling; Electronegative discharge; Inductively coupled plasma; Ion flux probe; Langmuir probe; Plasma etching; Plasma uniformity; Sulfur hexafluoride plasma

Indexed keywords

ELECTRIC DISCHARGES; ION BOMBARDMENT; IONIZATION OF GASES; PLASMA ETCHING; SILICON WAFERS; THERMAL DIFFUSION IN SOLIDS;

PLASMA REACTORS;

INDUCTIVELY COUPLED PLASMA;

EID: 0042428861     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.815243     Document Type: Article

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